Applied Surface Science

Applied Surface Science

A Journal Devoted to Applied Physics and Chemistry of Surfaces and Interfaces





Editor-in-Chief::H. Rudolph





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Aims & Scope

Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.

This journal accommodates the following topics:

  • Surface science of catalysis, electrocatalysis and photocatalysis;
  • Deposition and growth;
  • 2D assembly;
  • Surface and interface modification by directed energy deposition (lasers, ion or electron beams) or other techniques such as plasmas;
  • Surface engineering and functionalization;
  • Functional surfaces and coatings;
  • Electrochemistry at surfaces and corrosion protection strategies;
  • Surface science applied to energy conversion and storage;
  • Surface nanotechnology and devices;
  • Semiconductors - surface and interface;
  • Biointerfaces.

Note to authors
In order to be considered for publication, your paper must be a research study on the atomic and molecular level of material properties determined with specific surface approaches, either by experimental techniques or computational methods. If not, your submission will not be considered for publication and will not be sent out for peer-review.

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Surface scientists (physicists and chemists), electrochemists, solid-state physicists.

Abstracting and Indexing

Aluminium Industry Abstracts, Chemical Abstracts, Current Contents/Engineering, Computing & Technology, Current Contents/Physics, Chemical, & Earth Sciences, El Compendex Plus, Engineered Materials Abstracts, Engineering Index, INSPEC, Metals Abstracts, Science Citation Index, Scopus
Editor-in-Chief: H. Rudolph Fac. of Military Sciences (FMS), Netherlands Defence Academy, P.O. Box 90002, 4800 PA Breda, Netherlands, Editors: J.G. Chen Dept. of Chemical Engineering, Columbia University, 500 W. 120th Street, New York, 10027, USA, W. Huang Dept. of Chemical Physics, University of Science and Technology of China (USTC), 230026 Hefei, China, P. Kingshott Fac. of Engineering & Industrial Sciences, Swinburne University of Technology, 543-454 Burwood Road, Hawthorn, VIC 3122, Australia, H. Kobayashi The Inst. of Scientific and Industrial Reasea, Osaka University, 8-1 Mihogaoka, Ibarikai, 567 Osaka, Japan, T. Komeda Tohoku University, Inst. of Multidisciplinary Res. for Adv. Materials (IMRAM), 2-1-1 Katahira, Aoba-ku, Sendai-Shi, 980-8577, Japan, T. Lippert Materials Group, Paul Scherrer Institute (PSI), CH-5232 Villigen PSI, Switzerland, M.F. Montemor ICEMS-DEQ, Instituto Superior Tecnico, Avenida Rovisco Pais, 1049-001 Lisboa, Portugal, R.L. Opila Dept. of Material Science and Engineering, University of Delaware, Dupont Hall 210, Newark, DE 19716, USA, F. Rosei INRS-EMT, 1650 Blvd. Lionel Boulet, Varennes, J3X 1S2, Canada, P. Schaaf Inst. of Materials Engineering and Inst. of Micro- and Nanotechnologies, Technische Universität Ilmenau, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau, Germany, S. Suzer Dept. of Chemistry & Materials Science, Nanotechnology Research Center, Bilkent University, Bilkent, 06800 Ankara, Turkey, Advisory Editorial Board: K. Akimoto Ibaraki, Japan, D.E. Aspnes Raleigh, NC, USA, A Bandyopadhyay Pullman, WA, USA, B.N. Dev Jadavpur, Kolkata, India, E. Fortunato Caparica, Portugal, C. Fotakis Heraklion, Crete, Greece, Y. Gao Rochester, NY, USA, A.R. González-Elipe Sevilla, Spain, S. Hofmann Stuttgart, Germany, A. Juan Bahia Blanca, Argentina, Y. Leterrier Lausanne, Switzerland, G. Lopinski Ottawa, ON, Canada, R. Morent Ghent, Belgium, J.W. Niemantsverdriet Eindhoven, Netherlands, E. Pincik Bratislava, Slovakia, N. Pryds Roskilde, Denmark, P. Schmuki Erlangen, Germany, A. Shard Teddington, UK, C.Q. Sun Singapore, Singapore, R.M. Wallace Richardson, TX, USA, J. Yu Wuhan, China, H.J.W. Zandvliet Enschede, Netherlands, W. Zheng Changchun City, China
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