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Applied Surface Science
 
 

Applied Surface Science

A Journal Devoted to Applied Physics and Chemistry of Surfaces and Interfaces

 
 

Journal

 2.112(2012)

2.099

Editor-in-Chief::H. Rudolph

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01694332

283-318

36

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USD 11,337.00
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Aims & Scope

Applied Surface Science covers topics contributing to a better understanding of applications of surfaces, interfaces, and nanostructures. The journal is concerned with scientific research on the atomic and molecular level of material properties, determined with multiple surface analytical techniques, as well as the processing and application of such structures.

Processes include deposition and growth, oxidation and nitridation, surface and interface reactions, in general, as well as their modification by directed energy deposition (lasers, ion or electron beams) or other techniques such as plasmas.

Important subject areas include optical, electronic, (opto)-electronic, magnetic materials, bio-compatible materials, complex material applications, and thermal, electrical, chemical, physical and mechanical processes at well-defined surfaces and interfaces, e.g., the processes occurring in catalysis, corrosion and wear, are welcome to Applied Surface Science. However, papers with purely catalysis, corrosion and/or electrochemistry focus, or papers devoted fully to devices are considered to be more suitable for a topical journal where they find a more dedicated audience.

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Audience

Surface scientists (physicists and chemists), electrochemists, solid-state physicists.

Abstracting and Indexing

Aluminium Industry Abstracts, Chemical Abstracts, Current Contents/Engineering, Computing & Technology, Current Contents/Physics, Chemical, & Earth Sciences, El Compendex Plus, Engineered Materials Abstracts, Engineering Index, INSPEC, Metals Abstracts, Science Citation Index, Scopus
Editor-in-Chief: H. Rudolph Fac. of Military Sciences (FMS), Netherlands Defence Academy, P.O. Box 90002, 4800 PA Breda, Netherlands, Editors: J.G. Chen Dept. of Chemical Engineering, Columbia University, 500 W. 120th Street, New York, 10027, USA, W. Huang Dept. of Chemical Physics, University of Science and Technology of China (USTC), 230026 Hefei, China, P. Kingshott Fac. of Engineering & Industrial Sciences, Swinburne University of Technology, 543-454 Burwood Road, Hawthorn, VIC 3122, Australia, H. Kobayashi The Inst. of Scientific and Industrial Reasea, Osaka University, 8-1 Mihogaoka, Ibarikai, 567 Osaka, Japan, T. Komeda Tohoku University, Inst. of Multidisciplinary Res. for Adv. Materials (IMRAM), 2-1-1 Katahira, Aoba-ku, Sendai-Shi, 980-8577, Japan, T. Lippert Materials Group, Paul Scherrer Institute (PSI), CH-5232 Villigen PSI, Switzerland, M.F. Montemor ICEMS-DEQ, Instituto Superior Tecnico, Avenida Rovisco Pais, 1049-001 Lisboa, Portugal, R.L. Opila Dept. of Material Science and Engineering, University of Delaware, Dupont Hall 210, Newark, DE 19716, USA, F. Rosei INRS-EMT, 1650 Blvd. Lionel Boulet, Varennes, J3X 1S2, Canada, P. Schaaf Inst. of Materials Engineering and Inst. of Micro- and Nanotechnologies, Technische Universität Ilmenau, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau, Germany, S. Suzer Dept. of Chemistry & Materials Science, Nanotechnology Research Center, Bilkent University, Bilkent, 06800 Ankara, Turkey, Advisory Editorial Board: K. Akimoto Ibaraki, Japan, D.E. Aspnes Raleigh, NC, USA, A Bandyopadhyay Pullman, WA, USA, B.N. Dev Jadavpur, Kolkata, India, E. Fortunato Caparica, Portugal, C. Fotakis Heraklion, Crete, Greece, Y. Gao Rochester, NY, USA, A.R. González-Elipe Sevilla, Spain, S. Hofmann Stuttgart, Germany, A. Juan Bahia Blanca, Argentina, Y. Leterrier Lausanne, Switzerland, G. Lopinski Ottawa, ON, Canada, R. Morent Ghent, Belgium, J.W. Niemantsverdriet Eindhoven, Netherlands, E. Pincik Bratislava, Slovakia, N. Pryds Roskilde, Denmark, P. Schmuki Erlangen, Germany, A. Shard Teddington, UK, C.Q. Sun Singapore, Singapore, R.M. Wallace Richardson, TX, USA, J. Yu Wuhan, China, H.J.W. Zandvliet Enschede, Netherlands, W. Zheng Changchun City, China
 
 
 
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