Journal of Colloid and Interface Science

Editor-in-Chief: D.T. Wasan Illinois Institute of Technology, Chicago, IL, USA, Co-Editors: J. Eastoe University of Bristol, Bristol, UK, A.T. Hubbard Santa Barbara, CA, USA, M.A. Lopez-Quintela Universidade de Santiago de Compostela, Santiago de Compostela, Spain, G.-Q.M. Lu University of Queensland, Brisbane, QLD, Australia, M. Malmsten Uppsala Universitet, Uppsala, Sweden, D. Y. Zhao Fudan University, Shanghai, China, Advisory Board: J. Addai-Mensah Adelaide, SA, Australia, S. Allison Atlanta, GA, USA, P. Baglioni Sesto Fiorentino, Italy, B. Bhushan Columbus, OH, USA, W. Deen Cambridge, MA, USA, P. Dowding Abingdon, Oxfordshire, UK, C. Drummond Clayton, VIC, Australia, A. Fujishima Kawasaki-shi, Kanagawa-ken, Japan, D.V. Goia Potsdam, NY, USA, R. Guo Yangzhou, Jiangsu, China, V.K. Gupta Roorkee, India, J. Hao Jinan, China, C. Hoppe Mar del Plata, Argentina, W. Parak Marburg, Germany, J. Penfold Oxon, UK, C. Picart Grenoble, France, M.-P. Pileni Paris Cedex 05, France, V. Puntes Barcelona, Spain, B. Saunders Manchester, UK, I. Tucker Bebington, Wirral, UK, J-C. Voegel Strasbourg, France, J. Walz Blacksburg, VA, USA, A. Xenakis Athens, Greece, A.L. Zydney University Park, PA, USA, Past Editors: V.K. La Mer , A.C. Zettlemoyer , M. Kerker , J.P. Kratohvil , H. Kunieda‡