Developments in Surface Contamination and Cleaning - Vol 5

Developments in Surface Contamination and Cleaning - Vol 5, 1st Edition

Contaminant Removal and Monitoring

Developments in Surface Contamination and Cleaning - Vol 5, 1st Edition,Rajiv Kohli,Kashmiri L. Mittal,ISBN9781437778816


William Andrew




This book in the series covers methods for removal of non-particulate contamination, monitoring and structural characterization on the nanoscale to help develop preventive and mitigation methods for contamination control

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Key Features

  • Comprehensive coverage of innovations in surface contamination and cleaning
  • Written by established experts in the contamination and cleaning field
  • Each chapter is a comprehensive review of the state of the art
  • Case studies included


In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or dealing with the consequences of surface contamination.

This volume complements Volumes 3 and 4 of this series, which focused largely on particulate contaminants. The expert contributions in this volume cover methods for removal of non-particulate contaminants, such as metallic and non-metallic thin films, hydrocarbons, toxic and hazardous chemicals, and microbiological substances, as well as contamination monitoring in pharmaceutical manufacturing, and an innovative method for characterization at the nanoscale.


As a whole, the series will create a unique and comprehensive knowledge base of crucial importance to those in research and development, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Researchers in an academic setting will also find these volumes excellent source books

Rajiv Kohli

NASA Johnson Space Center -Rajiv Kohli is a leading expert in contaminant particle behaviour, surface cleaning and contamination control. At the NASA Johnson Space Center he has primary responsibility for contamination control related to spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program (designed to meet the United States Vision for Space Exploration). He helped to develop solvent-based cleaning applications for the nuclear industry and an innovative microabrasive system for a wide variety of applications in the commercial sector. He co-authored Commercial Utilization of Space: An International Comparison of Framework Conditions, and has published over 200 technical papers. His other specialisms include precision cleaning, solution and surface chemistry, advance materials and chemical thermodynamics. In 2005, Dr. Kohli received the Public Service Medal, one of NASA’s highest awards, for contributions to the Space Shuttle Return to Flight project.

Affiliations and Expertise

National Aeronautics and Space Administration, Houston, TX, USA

View additional works by Rajiv Kohli

Kashmiri L. Mittal

Editor: ‘Reviews of Adhesion and Adhesives’ was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of adhesion science and technology and in surface contamination and cleaning. He is the founding editor of the Journal of Adhesion Science and Technology and is editor of 85 books, many of them dealing with surface contamination and cleaning. In 2002, the Kash Mittal Award was inaugurated for his extensive efforts and significant contributions to the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title honoris causa by the Maria Curie-Sklodowska University in Lubin, Poland in 2003.

Affiliations and Expertise

Editor, Reviews of Adhesion and Adhesives

View additional works by Kashmiri L. Mittal

Developments in Surface Contamination and Cleaning - Vol 5, 1st Edition


About the Editors


Chapter 1. Surface Contamination Removal Using Dense-Phase Fluids: Liquid and Supercritical Carbon Dioxide

1 Introduction

2 Surface Cleanliness Levels

3 Dense-Phase Fluids

4 Principles of Dense-Phase CO2 Cleaning

5 Advantages and Disadvantages of Dense-Phase CO2 Cleaning

6 Applications

7 Summary and Conclusions




Chapter 2. Plasma Cleaning for Electronic, Photonic, Biological, and Archeological Applications

1 Introduction

2 Plasma Reactor Configurations

3 Semiconductor Manufacturing

4 Photovoltaic Cell Processing

5 Plasma Sterilization

6 Plasma Cleaning in the Restoration Industry

7 Plasma Cleaning Applications in Electron Microscopy

8 Additional Plasma Applications

9 Summary and Future Needs


Chapter 3. Clean Room Wipers for Removal of Surface Contamination

1 Principles of Wiping for Removal of Contaminants

2 Types of Wipers

3 Wiper Testing

4 Methods to Assess Wiper Quality

5 The Importance of Automation

6 Applications

7 Current Trends in Wiper Technology

8 Future Developments in Clean Room Wipers


Chapter 4. Impact of Microbial Surface Contamination and Effective Environment Monitoring System in Pharmaceutical Manufacturing

1 Introduction

2 Impact of Microorganisms in the Environment

3 Sanitization

4 Environmental Monitoring

5 Environmental Contamination Control

6 Future Developmental Requirements


Chapter 5. Neutron Holography as a Technique for Probing Local Atomic Structures on the Nanoscale

1 Introduction

2 Basic Concepts

3 Experimental Requirements

4 Examples

5 Outlook



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