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Handbook of Thin Film Deposition
 
 

Handbook of Thin Film Deposition, 3rd Edition

 
Handbook of Thin Film Deposition, 3rd Edition,Krishna Seshan,ISBN9781437778731
 
 
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William Andrew

9781437778731

9781437778748

408

229 X 152

Seshan’s handbook is a practical survey of the key technologies and new developments, aimed at the engineers and managers involved in all stages of the process: design, fabrication, quality assurance and applications.

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Key Features

    • A practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance and applications.
    • Covers core processes and applications in the semiconductor industry and new developments in the photovoltaic and optical thin film industries.

    • The new edition takes covers the transition taking place in the semiconductor world from Al/SiO2 to copper interconnects with low-k dielectrics.

    • Written by acknowledged industry experts from key companies in the semiconductor industry including Intel and IBM.

    • Foreword by Gordon E. Moore, co-founder of Intel and formulator of the renowned ‘Moore’s Law’ relating to the technology development cycle in the semiconductor industry.

     

    Description

    The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes.  In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films.

    Readership

    New third edition of the popular book on deposition. Aimed at engineers, technicians, and plant personnel in the semiconductor and related industries.

    Krishna Seshan

    Affiliations and Expertise

    was formerly Assistant Professor in Materials Science at the University of Arizona and has extensive professional experience as a technologist with both the IBM and Intel Corporations.

    Handbook of Thin Film Deposition, 3rd Edition

    Foreword to the Third Edition

    Scaling of Devices and Thermal Scaling

    PVD - Special Topics

    CVD New Developments

    CVD Equipment

    CMP Method and Practice

    Process Technology for Copper Interconnects

    Optical Thin Films

    Thin Films in Photovoltaics

    Thin Films in Memory Applications

    Index

     
     
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