Key Features
- Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements
- Practical information on technology trends, role of sputtering and major OEMs
- Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc.
- Practical case-studies on target performance and troubleshooting
- Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry
Description
An important resource for the microelectronics and flat panel display industries, this book focuses on the development of sputtering targets for conductor, diffusion barrier, reflective, data storage and display applications.
Sarkar reviews essential microelectronics industry topics, including: history and technology trends; chip making fundamentals; deposition and properties of thin films; and the role of sputtering target performance on overall production yield. Materials science fundamentals, types of metallic materials for conductors, diffusion barrier, data storage, and flat panel display applications are also discussed.
The author illustrates his arguments with case studies and real-world examples of troubleshooting in an industrial setting.
Readership
Researchers, engineers, undergraduate and graduate students in the fields of semiconductors, displays, thin films (nanotechnology and MEMS) and related industries.
