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Developments in Surface Contamination and Cleaning, Vol. 1
 
 

Developments in Surface Contamination and Cleaning, Vol. 1, 2nd Edition

Fundamentals and Applied Aspects

 
Developments in Surface Contamination and Cleaning, Vol. 1, 2nd Edition,Rajiv Kohli,Kashmiri L. Mittal,ISBN9780323299602
 
 
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Kohli   &   Mittal   

William Andrew

9780323299602

1008

229 X 152

This book provides a state-of-the-art reference for all major areas in surface contamination and cleaning for industries ranging from semiconductor fabrication to space exploration, presenting an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation.

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USD 310.25
USD 365.00
 
 

Key Features

  • Provides best-practice guidance for scientists and engineers engaged in surface cleaning or those who handle the consequences of surface contamination
  • Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries as spearheaded by the semiconductor industry
  • Presents state-of-the-art survey information on precision cleaning and characterization methods as written by a team of world-class experts in the field

Description

Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation.

Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination.

In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants.

The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R&D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography.

Readership

Researchers and Engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography.

Rajiv Kohli

NASA Johnson Space Center -Rajiv Kohli is a leading expert in contaminant particle behaviour, surface cleaning and contamination control. At the NASA Johnson Space Center he has primary responsibility for contamination control related to spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program (designed to meet the United States Vision for Space Exploration). He helped to develop solvent-based cleaning applications for the nuclear industry and an innovative microabrasive system for a wide variety of applications in the commercial sector. He co-authored Commercial Utilization of Space: An International Comparison of Framework Conditions, and has published over 200 technical papers. His other specialisms include precision cleaning, solution and surface chemistry, advance materials and chemical thermodynamics. In 2005, Dr. Kohli received the Public Service Medal, one of NASA’s highest awards, for contributions to the Space Shuttle Return to Flight project.

Affiliations and Expertise

National Aeronautics and Space Administration (NASA), Houston, Texas, USA

View additional works by Rajiv Kohli

Kashmiri L. Mittal

Editor: ‘Reviews of Adhesion and Adhesives’ was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of adhesion science and technology and in surface contamination and cleaning. He is the founding editor of the Journal of Adhesion Science and Technology and is editor of 85 books, many of them dealing with surface contamination and cleaning. In 2002, the Kash Mittal Award was inaugurated for his extensive efforts and significant contributions to the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title honoris causa by the Maria Curie-Sklodowska University in Lubin, Poland in 2003.

Affiliations and Expertise

Editor, Reviews of Adhesion and Adhesives

View additional works by Kashmiri L. Mittal

Developments in Surface Contamination and Cleaning, Vol. 1, 2nd Edition

Part 1 Fundamentals
1 The Physical Nature of Very, Very Small Particles and its Impact on their Behaviour 
2 Transport and Deposition of Aerosol Particles 
3 Relevance of Particle Transport in Surface Deposition and Cleaning 
4 Aspects of Particle Adhesion and Removal 
5 Tribological Implications of Particles 
6 ESD Controls in Cleanroom Environments: Relevance to Particle Deposition 
7 Airborne Molecular Contamination: Contamination on Substrates and Environments in Semiconductors and Other Industries 
Part 2 Characterization
8 Surface Analysis Methods for Contaminant Identification 
9 Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles 
10 Wettability Techniques to Monitor the Cleanliness of Surfaces 
Part 3 Techniques for Removal of Surface Contamination
11 Cleaning with Solvents Durkee Reprint
12 Removal of Particles by Chemical Cleaning 
13 The Use of Surfactants to Enhance Particle Removal from Surfaces 
14 Microabrasive Precision Cleaning and Processing Technology 
15 Cleaning Using High-Speed Impinging Jet 
16 Carbon Dioxide Snow Cleaning Sherman Update
17 Cleaning Using Argon/Nitrogen Cryogenic Aerosols 
18 Coatings for Preventing or Deactivation of Biological Contaminants 
19 A Detailed Study of Semiconductor Wafer Drying 
 
 
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