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Laser Crystallization of Silicon - Fundamentals to Devices
 
 

Laser Crystallization of Silicon - Fundamentals to Devices, 1st Edition

 
Laser Crystallization of Silicon - Fundamentals to Devices, 1st Edition,Norbert Nickel,ISBN9780127521848
 
 
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Semiconductors and Semimetals

  

Academic Press

9780127521848

9780080540948

204

241 X 165

An essential update on the latest experimental and theoretical studies in the field of Laser Crystallization of Silicon

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Key Features

Valuable applications for industry, particularly in the fabrication of thin-film electronics
Each chapter has been peer reviewed
An important and timely contribution to the semiconductor literature

Description

This book on the Laser Crystallization of Silicon reviews the latest experimental and theoretical studies in the field. It has been written by recognised global authorities and covers the most recent phenomena related to the laser crystallization process and the properties of the resulting polycrystalline silicon.
Reflecting the truly interdisciplinary nature of the field that the series covers, this volume will continue to be of great interest to physicists, chemists, materials scientists and device engineers in modern industry.

Readership

Academic and Industrial researchers across all disciplines involved in the study of semiconductors and semimetals.

Norbert Nickel

Affiliations and Expertise

Hahn-Meitner-Institut, Berlin, Germany

Laser Crystallization of Silicon - Fundamentals to Devices, 1st Edition

Preface; introduction to laser crystallization of silicon; heat transfer and phase transformations in laser melting and recrystallization of amorphous thin si films; modelling laser-induced phase change processes: theory and computation; laser interference crystallization of amorphous films; structural and electronic properties of laser crystallized poly-si.
 
 
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