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PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing
 
 

PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing, 1st Edition

 
PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing, 1st Edition,Stephen Rossnagel,Ronald Powell,Abraham Ulman,ISBN9780125330268
 
 
 

Rossnagel   &   Powell   &   Ulman   

Academic Press

9780125330268

9780080542928

419

229 X 152

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Description

GENERAL DESCRIPTION OF THE SERIES
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.

GENERAL DESCRIPTION OF THE VOLUME
This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.

Readership

Thin film and surface science researchers in chemistry, materials science, electrical engineering, biology, and condensed matter physics.

Stephen Rossnagel

Affiliations and Expertise

IBM Corporation, T.J. Watson Research Center, Yorktown Heights, New York, U.S.A.

View additional works by Stephen M. Rossnagel

Ronald Powell

Affiliations and Expertise

Novellus Systems, Inc., Palo Alto, California

View additional works by Ronald Powell

Abraham Ulman

Affiliations and Expertise

Polytechnic University, Brooklyn, New York, U.S.A.

View additional works by Abraham Ulman

PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing, 1st Edition

Useful Conversion Factors and Constants. Introduction. Physics of Sputtering. Plasma Systems. The Planar Magnetron. Sputtering Tools. Directional Deposition. Planarized PVD: Use of Elevated Temperature and/or High Pressure. Ionized Magnetron Sputter Deposition. PVD Materials and Processes. Process Modeling for Magnetron Deposition. Sputtering Targets. Index.
 
 
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