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Chemical Vapor Deposition

Principles and Applications

  • 1st Edition - January 26, 1993
  • Editors: M. L. Hitchman, K. F. Jensen
  • Language: English
  • Hardback ISBN:
    9 7 8 - 0 - 1 2 - 3 4 9 6 7 0 - 6

This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from… Read more

Chemical Vapor Deposition

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This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.