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Fundamental Principles of Engineering Nanometrology
 
 

Fundamental Principles of Engineering Nanometrology, 2nd Edition

 
Fundamental Principles of Engineering Nanometrology, 2nd Edition,Richard Leach,ISBN9781455777532
 
 
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William Andrew

9781455777532

9781455777501

384

235 X 191

Richard Leach demystifies the principles and techniques of nanometrology and introduces readers to the standards, equipment, and analytical methods that together unlock the industrial and research potential of nanotechnology.

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Key Features

  • Demystifies nanometrology for a wide audience of engineers, scientists, and students involved in nanotech and advanced manufacturing applications and research
  • Introduces metrologists to the specific techniques and equipment involved in measuring at the nano-scale or to nano-scale uncertainty
  • Fully updated to cover the latest technological developments, standards, and regulations

Description

Working at the nano-scale demands an understanding of the high-precision measurement techniques that make nanotechnology and advanced manufacturing possible. Richard Leach introduces these techniques to a broad audience of engineers and scientists involved in nanotechnology and manufacturing applications and research. He also provides a routemap and toolkit for metrologists engaging with the rigor of measurement and data analysis at the nano-scale. Starting from the fundamentals of precision measurement, the author progresses into different measurement and characterization techniques.

The focus on nanometrology in engineering contexts makes this book an essential guide for the emerging nanomanufacturing / nanofabrication sector, where measurement and standardization requirements are paramount both in product specification and quality assurance. This book provides engineers and scientists with the methods and understanding needed to design and produce high-performance, long-lived products while ensuring that compliance and public health requirements are met.

Updated to cover new and emerging technologies, and recent developments in standards and regulatory frameworks, this second edition includes many new sections, e.g. new technologies in scanning probe and e-beam microscopy, recent developments in interferometry and advances in co-ordinate metrology.

Readership

Engineers and scientists involved in micro- and nanomanufacturing and other nanotechnology areas; students and academics in micro- and nanotechnology.

Richard Leach

Richard Leach is a Principal Research Scientist in the Mass & Dimensional Group, Industry & Innovati

Affiliations and Expertise

National Physical Laboratory, UK

Fundamental Principles of Engineering Nanometrology, 2nd Edition

  • Acknowledgements
  • List of Figures
  • List of Tables
  • Chapter 1. Introduction to Metrology for Advanced Manufacturing and Micro- and Nanotechnology
    • 1.1 What is engineering nanometrology?
    • 1.2 The contents of this book and differences to edition 1
    • References
  • Chapter 2. Some Basics of Measurement
    • 2.1 Introduction to measurement
    • 2.2 Units of measurement and the SI
    • 2.3 Length
    • 2.4 Mass
    • 2.5 Force
    • 2.6 Angle
    • 2.7 Traceability
    • 2.8 Accuracy, precision, resolution, error and uncertainty
    • 2.9 The laser
    • References
  • Chapter 3. Precision Measurement Instrumentation – Some Design Principles
    • 3.1 Geometrical considerations
    • 3.2 Kinematic design
    • 3.3 Dynamics
    • 3.4 The Abbe principle
    • 3.5 Elastic compression
    • 3.6 Force loops
    • 3.7 Materials
    • 3.8 Symmetry
    • 3.9 Vibration isolation
    • References
  • Chapter 4. Length Traceability Using Interferometry
    • 4.1 Traceability in length
    • 4.2 Gauge blocks – both a practical and traceable artefact
    • 4.3 Introduction to interferometry
    • 4.4 Interferometer designs
    • 4.5 Measurement of gauge blocks by interferometry
    • References
  • Chapter 5. Displacement Measurement
    • 5.1 Introduction to displacement measurement
    • 5.2 Basic terms
    • 5.3 Displacement interferometry
    • 5.4 Strain sensors
    • 5.5 Capacitive displacement sensors
    • 5.6 Eddy current and inductive displacement sensors
    • 5.7 Optical encoders
    • 5.8 Optical fibre sensors
    • 5.9 Other optical displacement sensors
    • 5.10 Calibration of displacement sensors
    • References
  • Chapter 6. Surface Topography Measurement Instrumentation
    • 6.1 Introduction to surface topography measurement
    • 6.2 Spatial wavelength ranges
    • 6.3 Historical background of classical surface texture measuring instrumentation
    • 6.4 Surface profile measurement
    • 6.5 Areal surface texture measurement
    • 6.6 Surface topography measuring instrumentation
    • 6.7 Optical instruments
    • 6.8 Capacitive instruments
    • 6.9 Pneumatic instruments
    • 6.10 Calibration of surface topography measuring instruments
    • 6.11 Uncertainties in surface topography measurement
    • 6.12 Metrological characteristics
    • 6.13 Comparisons of surface topography measuring instruments
    • 6.14 Determination of the spatial frequency response
    • 6.15 Software measurement standards
    • References
  • Chapter 7. Scanning Probe and Particle Beam Microscopy
    • 7.1 Scanning probe microscopy
    • 7.2 Scanning tunnelling microscopy
    • 7.3 Atomic force microscopy
    • 7.4 Examples of physical properties measurement using AFM
    • 7.5 Scanning probe microscopy of nanoparticles
    • 7.6 Electron microscopy
    • 7.7 Other particle beam microscopy techniques
    • References
  • Chapter 8. Surface Topography Characterisation
    • 8.1 Introduction to surface topography characterisation
    • 8.2 Surface profile characterisation
    • 8.3 Areal surface texture characterisation
    • 8.4 Fractal methods
    • 8.5 Comparison of profile and areal characterisation
    • References
  • Chapter 9. Coordinate Metrology
    • 9.1 Introduction to CMMs
    • 9.2 Sources of error on CMMs
    • 9.3 Traceability, calibration and performance verification of CMMs
    • 9.4 Micro-CMMs
    • 9.5 Micro-CMM probes
    • 9.6 Verification and calibration of micro-CMMs
    • References
  • Chapter 10. Mass and Force Measurement
    • 10.1 Traceability of traditional mass measurement
    • 10.2 Low-mass measurement
    • 10.3 Low-force measurement
    • References
  • Appendix A. SI Units of Measurement and Their Realisation at NPL
  • Appendix B. SI Derived Units
    • Examples of SI derived units expressed in terms of base units
    • SI derived units with special names and symbols
  • Index
 
 
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