Daniel Gall

Daniel Gall

Professor Daniel Gall holds an associate professor position in the Materials Science and Engineering Department at the Rensselaer Polytechnic Institute. He received his Diploma from the University of Basel, Switzerland, in 1994, and his Ph.D. from the University of Illinois at Urbana-Champaign in 2000. Prof. Gall has been a Visiting Scientist at the Frederick Seitz Materials Research Laboratory, Illinois, has served as Assistant Editor and Editorial Board Member for Thin Solid Films, and as Associate Editor for the Journal of Vacuum Science and Technology A. He is the chair-elect of the AVS Advanced Surface Engineering Division and serves as session, symposium, and program chair and as proceedings editor for the International Conference for Metallurgical Coatings and Thin Films and the AVS International Symposium.

Prof. Gall’s research focuses on the development of an atomistic understanding for thin film growth, with particular interest in transition-metal nitride coatings, ion-surface interactions, and glancing angle deposition. He has pioneered a multiple length-scale approach to explain texture evolution in hard-coatings, has shown how low-energy ion-irradiation can be employed to control surface diffusion processes and resulting microstructures, and has developed a variety of uniquely shaped nanostructure architectures by exploiting atomic shadowing effects during physical vapor deposition. His research on novel transition-metal nitrides was identified as one of “the 100 most important scientific discoveries during the past two and a half decades, supported by the US Department of Energy’s Office of Science”. He also won the 2006 Alfred H. Geisler Memorial Award for “Outstanding Contributions in Education and Thin Film Growth Research,” the Faculty Early Career Development (CAREER) Award from the National Science Foundation, the 2007 Outstanding Research Award from the Rensselaer School of Engineering, the 2008 Early Career Award for “Excellence in Educat

Affiliations and Expertise

Associate Professor, Rensselaer Polytechnic Institute, Troy, NY

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Daniel Gall

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